Everyone knows that the United States, the Netherlands, Japan and other countries have joined forces to block China's core technologies in order to prevent China's 14-nanometer technology from going further.
To tell you the truth, the situation is very bad right now, we can't get ASML EUV lithography machine, we can't get 7 nm penetration lithography machine, we can't get Nikon and ASML, we can only get 14 nm process products.
Domestic lithography technology is still stuck at 90 nm, and there is still a long way to go from 14 nm.
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So many people feel that we want to surpass the United States in silicon-based chips, it is almost impossible, and our silicon-based chips are approaching their limit, sooner or later will be replaced by new materials, we must be ready.
Quantum chips, optical chips, and carbon-based chips are the future direction of development. In particular, China's carbon-based chips are far ahead in terms of materials, manufacturing, research and development, and by the end of 2022, the number of graphene patent applications in China has reached about 80% of the world.
Moreover, because the conductivity of carbon-based transistors is better than that of silicon-based transistors do not know how many times, so in terms of performance, carbon-based transistors are more than ten times better than silicon-based transistors, and at this point, the power consumption of carbon-based transistors is also much lower than that of silicon-based transistors.
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Another way of saying is that if carbon-based chips do not use silicon wafers, then the technology of lithography machines will undergo earth-changing changes, and EUV lithography machines will no longer be needed, and China core will no longer be limited by lithography machines, which is a direction worth working towards.
In fact, so far, carbon-based chips are still in concept, there is no real sense of mass production, more is used to do scientific research.
In addition, the carbon transistor contains four free electrons, and its thermal conductivity and electronic activity are high, which makes its internal structure very unstable, which has become a difficult problem in the preparation of carbon-based chips.
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In addition, as far as the current research is concerned, the production of carbon-based transistors, like existing silicon-based transistors, are made with projectors, which project the circuit, and the principle and steps are the same.
In other words, want to use carbon-based chips to bypass the lithography machine and EUV lithography machine, I am afraid it is not very realistic at this stage, because the only difference between carbon-based chips and silicon-based chips is the difference in material, but the process is much the same.
Of course, the technology of carbon-based chips is much higher than that of silicon-based chips, 40nm carbon-based chips, and it is even possible to reach 3nm silicon-based chips, and now we have mastered the technology of 14nm, and are fully capable of producing a new carbon-based chip.
But to be honest, any technology, want to surpass other countries, must have enough technology, otherwise, it will be surpassed by other countries, which is impossible, so we must develop in the semiconductor industry, make up for our shortcomings, let us enter a new era, isn't it?
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